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X. K. Man, D. Andelman, and H. Orland, Block Copolymer on Nano-patterned Surfaces with Free Interface. Phys. Rev. E Rapid Communications 86, 010801 (2012).
发布时间：2018-03-19点击次数：
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基础研究
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上一条：K. Izumi, N. Laachi, X. K. Man, K. T. Delaney, and G. H. Fredrickson, Self-consistent Field Theory of Directed Self-assembly on Chemically-prepatterned Surfaces, Proceedings of SPIE 1, 9049 (2014).
下一条：P. Thebault, S. Niedermayer, S. Landis, P. Guenoun*, J. Daillant, X. K. Man*, D. Andelman, and H. Orland, Tailoring Diblock Coplymer Orientation using NanoImprint Lithography. Adv. Mater. 24, 1952-1955 (2012). Corresponding Author.