北京航空航天大学主页平台系统满兴坤--中文主页-- P. Thebault, S. Niedermayer, S. Landis, P. Guenoun*, J. Daillant, X. K. Man*, D. Andelman, and H. Orland, Tailoring Diblock Coplymer Orientation using NanoImprint Lithography. Adv. Mater. 24, 1952-1955 (2012). Corresponding Author.

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P. Thebault, S. Niedermayer, S. Landis, P. Guenoun*, J. Daillant, X. K. Man*, D. Andelman, and H. Orland, Tailoring Diblock Coplymer Orientation using NanoImprint Lithography. Adv. Mater. 24, 1952-1955 (2012). Corresponding Author.

发布时间：2018-03-19点击次数：

论文类型：基础研究

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上一条：X. K. Man, D. Andelman, and H. Orland, Block Copolymer on Nano-patterned Surfaces with Free Interface. Phys. Rev. E Rapid Communications 86, 010801 (2012). 下一条：W. Li, X. K. Man, D. Qiu, X. H. Zhang, and D. D. Yan, Structures and Interfaces between Two Colloidal Particles in Adsorptive Polymer Solutions, Polymer 53, 3409-3415 (2012).