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X. K. Man, D. Andelman, H. Orland, P. Thebault, P.-H. Liu, P. Guenoun, J. Daillant, and S. Landis, Organization of Block Copolymers using NanoImprint Lithography: Comparison of Theory and Experiments, Macromolecules 44, 2206-2211 (2011).
发布时间：2018-03-19点击次数：
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基础研究
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上一条：L.-J. Qu, X. K. Man, C. C. Han, D. Qiu, and D. D. Yan, Responsive Behaviors of Diblock Polyampholyte Brushes within Self-Consistent Field Theory, J. Phys. Chem. B 116, 743-750 (2012).
下一条：X. K. Man, D. Andelman, and H. Orland, Block Copolymer at Nano-Patterned Surfaces, Macromolecules 43, 7261-7268 (2010).